Keeping Pace with Moore’s Law
In 1965 Gordon Moore, one of the co-founders of Intel predicted that the number of transistors per integrated circuit would double every year. After 50+ years, Moore’s seminal observation has been shown to still be true, serving as a map that sets the direction for the modern digital revolution. Implicit in Moore’s law is the demand for ancillary technologies to keep pace with ever-increasing circuit density. These technologies include the methods and raw materials required to produce microprocessors with increasingly infinitesimal feature sizes.
Over the past three to four decades, semiconductors have been designed and manufactured using photolithography. These processes involve the use of lasers of ever-decreasing wavelengths of light to etch circuits. Most modern processes use a broad range of radiation-sensitive polymeric films, reactive gasses, and other chemicals in combination with physical equipment to create semiconductor highly-miniaturized microprocessors. The figure below describes the photolithography process at a high-level, depicting the use of photoresist materials (photo-responsive polymeric coatings), photomasks (a patterning plate), and incident light to create circuit patterns ultimately used in a microprocessor design.
For over a decade Halocarbon scientists and engineers have been partnering with leading manufacturers of the raw materials used in advanced photolithography processes. Halocarbon offers a broad range of high-purity electronics grade monomers, monomer pre-cursors, and other specialty fluorochemicals for use in this process. Our key technologies leverage our expertise in producing hexafluoroisopropyl (HFIP) derivatives, which have been demonstrated to provide unique value to the semiconductor fabrication industry.